LP‐3: <i>Late‐News Poster:</i> Photoalignment Materials Based on ω‐(4 ‐Chalconyloxy) Alkyl Groups Providing TN Alignment with Pretilt Angle by One‐Step Exposure of Polarized Near‐UV Light
Shoichi Nakata(Université Laval), Yuto Takeuchi, Yu Matsuki, Masayuki Kimura(Tulane University), Nobuo Bessho, Yutaka Makita, Keiko Kuriyama, Y. Natsui
Cited by 9
Related Papers
Rise in Insulin Resistance Is Associated With Escalated Telomere Attrition
|Circulation|2005|359
Photo Alignment Materials with High Sensitivity to Near UV Light.
|Journal of Photopolymer Science and Technology|1998|46
Preparation of aromatic copolyamides containing regularly placed 1,6-hexamethylenediamine units
|Journal of Polymer Science Part A Polymer Chemistry|1997|31
Strong Liquid Crystal Anchoring on Photo-Alignment Copolymer Films Containing ω-(4-chalconyloxy)alkyl Side Groups
|Japanese Journal of Applied Physics|2001|22