Effect of stoichiometry on the dielectric properties and soft mode behavior of strained epitaxial SrTiO3 thin films on DyScO3 substrates

Che-Hui Lee(Pennsylvania State University), Darrell G. Schlom(University of Salerno), S. Kamba(Czech Academy of Sciences, Institute of Plasma Physics), Venkatraman Gopalan(Pennsylvania State University), X. Martí(Czech Academy of Sciences), V. Skoromets(FZU ‒ Institute of Physics of the Academy of Sciences of the Czech Republic), Xiaoxing Xi(Temple University), M. Bernhagen, Shiming Lei(Hong Kong University of Science and Technology), Michael D. Biegalski(Oak Ridge National Laboratory), Reinhard Uecker(Leibniz Institute for Crystal Growth), Ryan Haislmaier(Pennsylvania State University), P. Kužel(FZU ‒ Institute of Physics of the Academy of Sciences of the Czech Republic)
Applied Physics Letters
February 25, 2013
Cited by 43


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