Nanohardness and contact angle of Si wafers implanted with N and C and Al alloy with N by plasma ion implantation
Fabian Gualda Dias(Instituto Nacional de Pesquisas Espaciais), C.M. Lepienski(Universidade Federal do Paraná), Nilson Cristino da Cruz(Universidade de Sorocaba), Elidiane Cipriano Rangel(Universidade de Sorocaba)
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