Soft X-ray lithography of high aspect ratio SU8 submicron structures

E. Reznikova; J. Mohr; Martin Boerner; V. Nazmov; Peter-Juergen Jakobs

doi:10.1007/s00542-007-0507-x

Soft X-ray lithography of high aspect ratio SU8 submicron structures

E. Reznikova(FZI Research Center for Information Technology), J. Mohr(FZI Research Center for Information Technology), Martin Boerner(FZI Research Center for Information Technology), V. Nazmov(FZI Research Center for Information Technology), Peter-Juergen Jakobs(FZI Research Center for Information Technology)

Microsystem Technologies

January 8, 2008

10.1007/s00542-007-0507-x

Cited by 104

Abstract

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