High-quality InGaN MQW on low-dislocation-density GaN substrate grown by hydride vapor-phase epitaxy
Chiaki Sasaoka(NEC (Japan)), Akira Sakai(NEC (Japan)), Akira Usui(Kōchi University), A. Kimura(Hiroshima University), Haruo Sunakawa(NEC (Japan)), M. Nido(NEC (Japan))
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