Removal efficiency of organic contaminants on Si wafer by dry cleaning using UV/O3 and ECR plasma

Kyeong-Keun Choi(Inha University), C.M. Lee(Inha University), Jihyun Lim(Inha University), S. K. Ghosh(Tata Institute of Fundamental Research)
Applied Surface Science
January 17, 2003
Cited by 71


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