Plasma deposition of boron-containing hard carbon films a-C/B:H from organic boron compounds
J. Winter(Ruhr University Bochum), P. Wienhold(Forschungszentrum Jülich), J. von Seggern, T. R. Rose(Forschungszentrum Jülich), L. Grobusch(Forschungszentrum Jülich), H.G. Esser
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