Strong surface segregation of Sb atoms at low temperatures during Si molecular beam epitaxy
Z. M. Jiang(Goodyear (United Kingdom)), I. K. Sou(Hong Kong University of Science and Technology), C. W. Pei(Fudan University), Liang‐Sheng Liao(Macau University of Science and Technology), Zichao Ma(Hong Kong University of Science and Technology), Quanjie Jia(Institute of High Energy Physics), Xuewu Zhou(Fudan University), Xun Wang(Fudan University), Xiu-Cai Jiang(Institute of High Energy Physics), T. L. Smith(Hong Kong University of Science and Technology), X.J Zhang(Fudan University)
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