Influence of baffle on improving the thickness uniformity of thin film deposited by magnetron sputtering system
He Yu(University of Electronic Science and Technology of China), Hongjun Jing(University of Electronic Science and Technology of China), Zhiming Wu(University of Electronic Science and Technology of China), Tao Wang(North China University of Science and Technology), Yadong Jiang(Ollscoil na Gaillimhe – University of Galway), Chao Chen(University of Electronic Science and Technology of China), Jing Jiang(University of Electronic Science and Technology of China)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
May 13, 2010
Cited by 0
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