Micromosaic formation in laser-irradiated Si probed by picosecond time-resolved x-ray diffraction
Hiroaki Kishimura(Tokyo Institute of Technology), Toshiyuki Atou(Tokyo Institute of Technology), Kazutaka G. Nakamura(Tokyo Institute of Technology), Yoichiro Hironaka(Institute for Laser Technology), Yasuhisa H. Okano(Tokyo Institute of Technology), Hiroto Morishita(Tokyo Institute of Technology), Ken‐ichi Kondo(Tokyo Institute of Technology)
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