Sub-100 nm structures by neutral atom lithography

Th. Schulze(University of Konstanz), J. Mlynek(University of Konstanz), Robert Mertens(Humboldt-Universität zu Berlin), Piet O. Schmidt(Leibniz University Hannover), B. Brezger(University of Konstanz), A.S. Bell(University of Konstanz), Tilman Pfau(University of Stuttgart)
Microelectronic Engineering
May 1, 1999
Cited by 25


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