Influence of oxygen pressure on the ferroelectric properties of BiFeO3 thin films on LaNiO3/Si substrates via laser ablation

Feng Yan(Hong Kong Polytechnic University), Li Lü(National University of Singapore), Tao Zhu(Yunnan University), M.O. Lai(National Taipei University of Technology)
Applied Physics A
July 20, 2010
10.1007/s00339-010-5918-3
Cited by 21

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