Electrical transport properties of Ti-doped Fe<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mi/><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>(0001) epitaxial films
Bei Zhao(Pacific Northwest National Laboratory), Scott A. Chambers(GA Drilling (Slovakia)), Tiffany C. Kaspar(Pacific Northwest National Laboratory), Timothy C. Droubay(Pacific Northwest National Laboratory), John S. McCloy(Pacific Northwest National Laboratory), V. Shutthanandan(Pacific Northwest National Laboratory), Mark Bowden(Pacific Northwest National Laboratory), Steve M. Heald(Argonne National Laboratory)
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