Interfaces in crystalline materials

F. Flóres(Universidad Autónoma de Madrid), R. Saiz-Pardo(Universidad Autónoma de Madrid), Raúl Rincón(Universidad Autónoma de Madrid)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
October 26, 1994
Cited by 1,663

Abstract

A brief review of the theoretical state of the art in the field of semiconductor interfaces is presented. It is shown that the important factor controlling the different semiconductor barrier heights is the density of states associated with the semiconductor dangling-bonds. passivated semiconductor surfaces present saturated dangling-bonds and have modified barrier heights. Results for hydrogen-passivated GaAs (110)-surfaces are presented; it is shown that the Schottky-barrier height formed by the deposition of a K-layer is sustantially changed by the hydrogen-passivation.


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