Properties of hydrogenated amorphous carbon thin films deposited by plasma-based ion implantation method
Masatou Ishihara(National Institute of Advanced Industrial Science and Technology), Yasutoshi Koga(Kurume University), Osamu Tsuda(National Institute of Advanced Industrial Science and Technology), Masahiro Suzuki(Fujita Health University), T. Watanabe(Nagoya University), Takako Nakamura(National Institute of Advanced Industrial Science and Technology), Akihiro Tanaka(National Institute of Advanced Industrial Science and Technology)
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