Enhancement and depletion mode GaN/AlGaN heterostructure field effect transistors

M. Asif Khan(Omega Optics (United States)), Q. Chen(Omega Optics (United States)), C. J. Sun(Omega Optics (United States)), J. Yang(Omega Optics (United States)), M. Blasingame(Omega Optics (United States)), M. S. Shur(University of Virginia), H. Park(University of Virginia)
Applied Physics Letters
January 22, 1996
Cited by 176Open Access
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Abstract

We report on the fabrication and characterization of Al0.1Ga0.9N/GaN heterojunction field effect transistors, both an enhancement mode and a depletion mode with a low pinchoff voltage, suitable for digital integrated circuit applications. For an enhancement mode device with a 1 μm gate length and 5 μm drain-to-source separation, the dc transconductance is around 23 mS/mm. Connecting the enhancement mode device as a switching transistor and a depletion mode device as a load, we demonstrate an AlGaN/GaN inverter.


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