Hierarchically Ordered Topographic Patterns via Plasmonic Mask Photolithography
Woo Soo Kim(Massachusetts Institute of Technology), Lin Jia(Institute for Soldier Nanotechnologies), Edwin L. Thomas(Institute for Soldier Nanotechnologies)
Cited by 37
Abstract
By employing a block copolymer to spatially organize silver nanoparticles, laser light can be concentrated via plasmon resonance to locally expose a photoresist. By subsequent development, this plasmonic lithography can provide deep subwavelength scale features.
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