Atomic Vapor Deposition Approach to In<SUB>2</SUB>O<SUB>3</SUB> Thin Films

Malte Hellwig(Ruhr University Bochum), Anjana Devi(Leibniz Institute for Solid State and Materials Research), Davide Barreca(National Interuniversity Consortium of Materials Science and Technology), Detlef Rogalla(University Hospitals of the Ruhr-University of Bochum), Roland A. Fischer(Technical University of Munich), Anja‐Verena Mudring(Aarhus University), Harish Parala(Ruhr University Bochum), Joanna Cybinksa, Benedikt Niermann(Ruhr University Bochum), Alberto Gasparotto(University of Padua), J. Winter(Ruhr University Bochum), J. Feydt(Max Planck Society), Stephan Irsen(Center of Advanced European Studies and Research)
Journal of Nanoscience and Nanotechnology
September 1, 2011
Cited by 8


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