Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
Kenji Nomura(Tokyo Institute of Technology), Hiromichi Ohta(Tokyo Institute of Technology), Akihiro Takagi(Tokyo Institute of Technology), Toshio Kamiya(Tokyo Institute of Technology), Masahiro Hirano(Tokyo Institute of Technology), Hideo Hosono(Tokyo Institute of Technology)
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