Hall effect measurements on epitaxial SmNiO<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:msub><mml:mrow/><mml:mn>3</mml:mn></mml:msub></mml:math>thin films and implications for antiferromagnetism
Sieu D. Ha(Harvard University), Shriram Ramanathan(Rutgers, The State University of New Jersey), J. D. Baniecki(Fujitsu (Japan)), D. M. Silevitch(California Institute of Technology), R. Jaramillo(Harvard University), Frank Schoofs(Harvard University), Kian Kerman(Interface (United States))
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