Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors

Nagendra Babu Srinivasan(Ruhr University Bochum), Roland A. Fischer(Technical University of Munich), Teresa de los Arcos(Ruhr University Bochum), Harry Becker(Ruhr University Bochum), Michael Krasnopolski(Ruhr University Bochum), Vanessa Gwildies(Ruhr University Bochum), Tobias Thiede(Ruhr University Bochum), Anjana Devi(Leibniz Institute for Solid State and Materials Research), Detlef Rogalla(University Hospitals of the Ruhr-University of Bochum)
Surface and Coatings Technology
June 13, 2013
Cited by 30


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