Photoetchable glass for microsystems: tips for atomic force microscopy
T. Dietrich(Fraunhofer Institute for Microengineering and Microsystems), Michaël Abraham(Fraunhofer Institute for Microengineering and Microsystems), J. Diebel(Fraunhofer Institute for Microengineering and Microsystems), M. Lacher(Fraunhofer Institute for Microengineering and Microsystems), Andreas Ruf(Fraunhofer Institute for Microengineering and Microsystems)
Cited by 17
Abstract
The authors present the use of photoetchable glasses in the field of microsystem technology. Its properties make it an ideal material for a wide variety of microsystems. A method to fabricate tips for atomic force microscopy out of this material is proposed. The main advantage of these tips with respect to conventional silicon-based tips is their large aspect ratio. Silicon nitride is used as a material for the cantilevers, which are on top of a glass carrier. Experimental results are presented.
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