Simple Approach to Wafer-Scale Self-Cleaning Antireflective Silicon Surfaces
Dianpeng Qi(Jilin University), Nan Lü(State Key Laboratory of Supramolecular Structure and Materials), Hongbo Xü(State Key Laboratory of Supramolecular Structure and Materials), Bingjie Yang(State Key Laboratory of Supramolecular Structure and Materials), Chunyu Huang(Jilin University), Miaojun Xu(State Key Laboratory of Supramolecular Structure and Materials), Liguo Gao(State Key Laboratory of Supramolecular Structure and Materials), Zhouxiang Wang(Jilin University), Lifeng Chi(University of Münster)
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Abstract
A simple approach to wafer-scale self-cleaning antireflective hierarchical silicon structures is demonstrated. By employing the KOH etching and silver catalytic etching, pyramidal hierarchical structures were generated on the crystalline silicon wafer, which exhibit strong antireflection and superhydrophobic properties after fluorination. Furthermore, a flexible superhydrophobic substrate was fabricated by transferring the hierarchical Si structure to the NOA 63 film with UV-assisted imprint lithography. This method is of potential application in optical, optoelectronic, and wettability control devices.
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