Tailoring Magnetic Doping in the Topological Insulator<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:msub><mml:mi>Bi</mml:mi><mml:mn>2</mml:mn></mml:msub><mml:msub><mml:mi>Se</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:math>

Jian‐Min Zhang(Beijing Institute of Technology), Yugui Yao(Beijing Institute of Technology), Wenguang Zhu(University of Science and Technology of China), Ying Zhang(Toyota Research Institute), Di Xiao(Pacific Northwest National Laboratory)
Physical Review Letters
December 26, 2012
Cited by 170


Related Papers