Confined High-Pressure Chemical Deposition of Hydrogenated Amorphous Silicon

Neil F. Baril(Pennsylvania State University), John V. Badding(Pennsylvania State University), Venkatraman Gopalan(Pennsylvania State University), N. Healy(University of Southampton), Pier J. A. Sazio(University of Southampton), M. Krishnamurthi(Pennsylvania State University), Anna C. Peacock(University of Southampton), Ali Borhan(Pennsylvania State University), Banafsheh Keshavarzi(Pennsylvania State University), Justin R. Sparks(Pennsylvania State University), Rongrui He(Pennsylvania State University), T. D. Day(Pennsylvania State University)
Journal of the American Chemical Society
December 8, 2011
10.1021/ja2067862
Cited by 56

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