Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system
Hao Wu(Nanjing University), Yanqing Lu(Nanjing University), Hua-chao Hu(Nanjing University), Xiao-wen Lin(Nanjing University), Ge Zhu(University of Rochester), Vladimir G. Chigrinov(Peoples' Friendship University of Russia), Jaewon Choi(University of Akron), Wei Hu(Peking University)
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