Investigations on the corrosion of copper patterns in the course of the “post-CMP cleaning” of integrated electronic microcircuits in oxalic acid aqueous solutions
Marie‐Claude Bernard(Centre National de la Recherche Scientifique), Alain Pailleret(Centre National de la Recherche Scientifique), Charles R. Mace(Tufts University), E. Ostermann(Centre National de la Recherche Scientifique), S. Joiret(Centre National de la Recherche Scientifique), C. Gabrielli(Centre National de la Recherche Scientifique)
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