Slow removal of vacancies in<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>B</mml:mi><mml:mn>2</mml:mn><mml:mo>−</mml:mo><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Ni</mml:mi></mml:mrow><mml:mrow><mml:mn>52</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Al</mml:mi></mml:mrow><mml:mrow><mml:mn>48</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>upon long-term low-temperature annealing
X. Y. Zhang(University of Stuttgart), H. SCHAEFER(University of Stuttgart), K. Blaurock(University of Stuttgart), K. J. Reichle(University of Stuttgart), Wolfgang Sprengel(Graz University of Technology), R. Henes
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