High Carrier Mobility in Single-Crystal Plasma-Deposited Diamond

Jan Isberg(ABB (Sweden)), J. Hammersberg(ABB (Sweden)), Erik M. J. Johansson(ABB (Sweden)), Tobias Wikström(ABB (Sweden)), Daniel J. Twitchen(Element Six (United Kingdom)), Andrew J. Whitehead(Element Six (United Kingdom)), Steven E. Coe(Element Six (United Kingdom)), G.A. Scarsbrook(Element Six (United Kingdom))
Science
September 5, 2002
Cited by 1,282

Abstract

Room-temperature drift mobilities of 4500 square centimeters per volt second for electrons and 3800 square centimeters per volt second for holes have been measured in high-purity single-crystal diamond grown using a chemical vapor deposition process. The low-field drift mobility values were determined by using the time-of-flight technique on thick, intrinsic, freestanding diamond plates and were verified by current-voltage measurements on p-i junction diodes. The improvement of the electronic properties of single-crystal diamond and the reproducibility of those properties are encouraging for research on, and development of, high-performance diamond electronics.


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