EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement

Kazuya Emura(University of Hyogo), Hiroo Kinoshita(University of Hyogo), Yasuji Muramatsu(University of Hyogo), Hirohito Tanino(University of Hyogo), Masato Yamaguchi(Jikei University School of Medicine), Yuichi Haruyama(University of Hyogo), Katsumi Ohmori(Tokyo Ohka Kogyo (Japan)), Tetsuo Harada(University of Hyogo), Kazufumi Sato(Tokyo Ohka Kogyo (Japan)), Takeo Watanabe(University of Hyogo), Tsubasa Fukui(University of Hyogo), Daiju Shiono(Tokyo Ohka Kogyo (Japan))
Journal of Photopolymer Science and Technology
January 1, 2014
Cited by 17


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