Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
Christoph Hoßbach(Technische Universität Dresden), Johann W. Bartha(Technische Universität Dresden), B. Adolphi(Technische Universität Dresden), J. Thomas(University of Calicut), M. Bertram(Technische Universität Dresden), H. Wojcik(Technische Universität Dresden), Uwe Mühle(AXO Dresden (Germany)), Bernd Hintze(AXO Dresden (Germany)), L. Wilde(Fraunhofer Institute for Photonic Microsystems), Matthias Albert(Technische Universität Dresden), S. Menzel(Leibniz Institute for Solid State and Materials Research), D. Schmidt(Technische Universität Dresden), S. Teichert(AXO Dresden (Germany))
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