Electron beam lithography using inorganic resist at low acceleration voltage

Yoshinori Ishii(Tokyo University of Science), Iwao Miyamoto(Tokyo University of Science), Ikken Sato(Tokyo Ohka Kogyo (Japan)), Jun Taniguchi(Tokyo University of Science), Y. Sakamoto(Tokyo Ohka Kogyo (Japan)), Kiichi Ishikawa(Okazaki City Hospital)
Unknown
January 1, 2005
Cited by 0


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