Electron beam lithography using inorganic resist at low acceleration voltage
Yoshinori Ishii(Tokyo University of Science), Iwao Miyamoto(Tokyo University of Science), Ikken Sato(Tokyo Ohka Kogyo (Japan)), Jun Taniguchi(Tokyo University of Science), Y. Sakamoto(Tokyo Ohka Kogyo (Japan)), Kiichi Ishikawa(Okazaki City Hospital)
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