A comparative study of the diffusion barrier properties of TiN and ZrN
Mikael Östling(KTH Royal Institute of Technology), S. Berg(Uppsala University), H. Norström(KTH Royal Institute of Technology), Hans‐Olof Blom(Uppsala University), S. Nygren(Ericsson (Sweden)), R. Buchta(KTH Royal Institute of Technology), C. S. Petersson(KTH Royal Institute of Technology)
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