Small band gap bowing in In1−xGaxN alloys

Junqiao Wu(Lawrence Berkeley National Laboratory), W. Walukiewicz(Lawrence Berkeley National Laboratory), K. M. Yu(Lawrence Berkeley National Laboratory), Joel W. Ager(Lawrence Berkeley National Laboratory), E. E. Häller(Lawrence Berkeley National Laboratory), H. J. Lü(Cornell University), W. J. Schaff(Cornell University)
Applied Physics Letters
June 24, 2002
Cited by 611Open Access
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Abstract

High-quality wurtzite-structured In-rich In1−xGaxN films (0⩽x⩽0.5) have been grown on sapphire substrates by molecular beam epitaxy. Their optical properties were characterized by optical absorption and photoluminescence spectroscopy. The investigation reveals that the narrow fundamental band gap for InN is near 0.8 eV and that the band gap increases with increasing Ga content. Combined with previously reported results on the Ga-rich side, the band gap versus composition plot for In1−xGaxN alloys is well fit with a bowing parameter of ∼1.4 eV. The direct band gap of the In1−xGaxN system covers a very broad spectral region ranging from near-infrared to near-ultraviolet.


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