Diffusion in the nickel-rich part of the Ni−Al system at 1000° to 1300°C; Ni3Al layer growth, diffusion coefficients, and interface concentrations

M. M. P. Janssen(Eindhoven University of Technology)

Metallurgical Transactions

June 1, 1973

10.1007/bf02668017

Cited by 216

Abstract

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