Comparison of Thickness and Morphology of Dotriacontane Films on SiO$_{2}$/Si Surfaces Vapor-deposited in High Vacuum with those Deposited from Solution

E. Cisternas, P. Soza, Valeria del Campo, E. Ramírez, U. G. Volkmann, H. Taub, F. Y. Hansen

Bulletin of the American Physical Society

March 16, 2006

Cited by 0

Abstract

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