A high performance field-reversed configurationa)

Michl Binderbauer(TAE Technologies, Inc (United States)), A. Sibley(TAE Technologies, Inc (United States)), M. Onofri(Aristotle University of Thessaloniki), N. Rath(TAE Technologies, Inc (United States)), P. Feng(TAE Technologies, Inc (United States)), Laura Galeotti(University of Urbino), J. H. Schroeder(TAE Technologies, Inc (United States)), F. Ceccherini(TAE Technologies, Inc (United States)), John Kinley(TAE Technologies, Inc (United States)), Xiaokang Yang(TAE Technologies, Inc (United States)), D. Gupta(TAE Technologies, Inc (United States)), L. C. Steinhauer(TAE Technologies, Inc (United States)), R. Andow(TAE Technologies, Inc (United States)), B. H. Deng(University of California, Los Angeles), S. Primavera(TAE Technologies, Inc (United States)), S. Gupta(TAE Technologies, Inc (United States)), K. D. Conroy(TAE Technologies, Inc (United States)), R. Mendoza(TAE Technologies, Inc (United States)), K. Knapp(TAE Technologies, Inc (United States)), E. Trask(Los Alamos National Laboratory), L. Schmitz(University of California, Los Angeles), Mark Hollins(TAE Technologies, Inc (United States)), S. Aefsky(Brandeis University), D. Q. Bui(TAE Technologies, Inc (United States)), D. Osin(Tokamak Energy (United Kingdom)), M. Tuszewski(Los Alamos National Laboratory), E. Granstedt(TAE Technologies, Inc (United States)), A. H. Cheung(TAE Technologies, Inc (United States)), N. Rostoker(TAE Technologies, Inc (United States)), S. Korepanov(TAE Technologies, Inc (United States)), H. Gota(TAE Technologies, Inc (United States)), J. Roméro(TAE Technologies, Inc (United States)), Y. Mok(TAE Technologies, Inc (United States)), L. Sevier(TAE Technologies, Inc (United States)), Richard Magee, J. D. Douglass(Sandia National Laboratories), S. Putvinski(TAE Technologies, Inc (United States)), T. Roche(TAE Technologies, Inc (United States)), F. Giammanco(University of Pisa), R. Clary(TAE Technologies, Inc (United States)), A. Nečas(TAE Technologies, Inc (United States)), А. А. Иванов(Budker Institute of Nuclear Physics), Heng Guo(Shihezi University), D. C. Barnes(TAE Technologies, Inc (United States)), M. C. Thompson(TAE Technologies, Inc (United States)), T. Tajima(Shibaura Institute of Technology), A. Smirnov(TAE Technologies, Inc (United States)), N. Bolte(TAE Technologies, Inc (United States)), E. Garate(TAE Technologies, Inc (United States)), Sean Dettrick(TAE Technologies, Inc (United States))
Physics of Plasmas
May 1, 2015
10.1063/1.4920950
Cited by 131

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