Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
Hyeon‐Ho Jeong(Gwangju Institute of Science and Technology), Peer Fischer(Yonsei University), In‐Sook Kim(Frederick National Laboratory for Cancer Research), Mariana Alarcón‐Correa(Heidelberg University), Kwanghyo Son(Max Planck Institute for Intelligent Systems), Wenwen Chen(Shenzhen University), Tung‐Chun Lee(University College London), Gisela Schütz(Max Planck Institute for Intelligent Systems), Andrew G. Mark(Max Planck Institute for Intelligent Systems)
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