Properties of Y-Ba-Cu-O thin films with ordered defect structure:<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Y</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Ba</mml:mi></mml:mrow><mml:mrow><mml:mn>4</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Cu</mml:mi></mml:mrow><mml:mrow><mml:mn>8</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">O</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn><mml:mn>0</mml:mn><mml:mo>−</mml:mo><mml:mi>x</mml:mi></mml:mrow></mml:msub></mml:mrow></mml:math>
K. Char(University of Geneva), S. S. Laderman(Hewlett-Packard (United States)), T. H. Geballe(Stanford University), I. Božović(Brookhaven National Laboratory), Mark Lee(University of Virginia), M. R. Beasley(University of Twente), R. H. Hammond(University of Geneva), A. Kapitulnik(SLAC National Accelerator Laboratory), A. F. Marshall(Stanford University), R. Barton(Stanford University)
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