Qi-Kun Xue

We consider in our work single crystal thin films of Bi${}_{2}$Se${}_{3}$, grown by molecular beam epitaxy, both with and without Pb doping. Angle-resolved photoemission data demonstrate topological surface states with a Fermi level lying inside the bulk band gap in the Pb-doped films. Transport data show weak localization behavior, as expected for a thin film in the two-dimensional limit (when the thickness is smaller than the inelastic mean free path), but a detailed analysis within the standard theoretical framework of diffusive transport shows that the temperature and magnetic field dependences of resistance cannot be reconciled in a theory that neglects inter-electron interactions. We demonstrate that an excellent account of quantum corrections to conductivity is achieved when both disorder and interaction are taken into account. These results clearly demonstrate that it is crucial to include electron-electron interaction for a comprehensive understanding of diffusive transport in topological insulators. While both the ordinary bulk and the topological surface states presumably participate in transport, our analysis does not allow a clear separation of the two contributions.

We report a transport study of ultrathin Bi${}_{2}$Se${}_{3}$ topological insulators with thickness from one quintuple layer to six quintuple layers grown on sapphire by molecular beam epitaxy. At low temperatures, the film resistance increases logarithmically with decreasing temperature, revealing an insulating ground state. The insulating behavior becomes more pronounced in thinner films. The sharp increase of resistance with magnetic field, however, indicates the existence of weak antilocalization originated from the topological protection. We show that this unusual insulating ground state in the two-dimensional limit of topological insulators is induced by the combined effect of strong electron interaction and topological delocalization.

The breaking of time reversal symmetry in topological insulators may create previously unknown quantum effects. We observed a magnetic quantum phase transition in Cr-doped Bi2(SexTe1-x)3 topological insulator films grown by means of molecular beam epitaxy. Across the critical point, a topological quantum phase transition is revealed through both angle-resolved photoemission measurements and density functional theory calculations. We present strong evidence that the bulk band topology is the fundamental driving force for the magnetic quantum phase transition. The tunable topological and magnetic properties in this system are well suited for realizing the exotic topological quantum phenomena in magnetic topological insulators.