J. P. Noël

ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTCO2 as the Ultimate Degradation Product in the H2O2 Oxidation of 2,4,6-Trichlorophenol Catalyzed by Iron TetrasulfophthalocyanineAlexander Sorokin, Sophie De Suzzoni-Dezard, Didier Poullain, Jean-Pierre Noël, and Bernard MeunierView Author Information Laboratorie de Chimie de Coordination du CNRS 205 route de Narbonne, 31077 Toulouse cedex CEA/Saclay, Service des Molécules Marquées 91191, Gif-sur-Yvette Cedex, FranceCite this: J. Am. Chem. Soc. 1996, 118, 31, 7410–7411Publication Date (Web):August 7, 1996Publication History Received18 January 1996Published online7 August 1996Published inissue 1 January 1996https://pubs.acs.org/doi/10.1021/ja960177mhttps://doi.org/10.1021/ja960177mrapid-communicationACS PublicationsCopyright © 1996 American Chemical SocietyRequest reuse permissionsArticle Views1023Altmetric-Citations152LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-AlertscloseSupporting Info (2)»Supporting Information Supporting Information SUBJECTS:Aromatic compounds,Degradation,Inorganic carbon compounds,Oxidation,Oxides Get e-Alerts

TiNx films have been deposited on C, Si, InP, and glass substrates by reactive sputtering of Ti in a dc magnetron system. The value of x and the crystal structure varied with the deposition parameters around the pressure hysteresis loop typical of reactive sputtering. With a fixed argon flow of 5 standard cm3min−1 (sccm) and a dc current of 2 A, the total pressure P remained constant at 0.23 Pa up to nitrogen flows f(N2) of 5.2 sccm. For 0≤f(N2)<4.1 sccm, only the hcp α-Ti phase was observed by x-ray and electron diffraction, but the films tended to be amorphous for f(N2)∼4.1 sccm. At f(N2)=5.1 sccm, the fcc TiN0.8 phase was observed with a lattice constant a0 of 0.422 nm; the value of x was obtained by Rutherford backscattering spectrometry (RBS) and nuclear reaction analysis (NRA). At f(N2)=5.2 sccm, the pressure increased rapidly to 0.35 Pa; thereafter, P varied linearly with f(N2) until f(N2) was reduced to 3.0 sccm. This behavior is due to the formation of a nitride layer on the Ti target. In this condition, fcc TiN1.2 films with a0=0.428 nm were obtained for all f(N2). The diffusion barrier characteristics of these films were determined by annealing Au/TiN1.2/InP samples at different temperatures. Comparisons were made with samples where 50 nm thick TiN1.2 films were replaced by 50 nm Cr or Pt. Whereas 1 wt.% In was detected in the Au after annealing for 60 s at 500 °C for Pt and 300 s for Cr, no In was detected for the TiN1.2 barrier after 24 h.