Erick Ulin-Avila

Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing.

We report a direct experimental evidence of stimulated emission of surface plasmon polaritons (SPPs) at telecom wavelengths (1532 nm) with erbium doped glass as a gain medium. We observe an increase in the propagation length of signal surface plasmons when erbium ions are excited optically using pump SPP. The design, fabrication, and characterization of SPP waveguides, thin gold metal strips, embedded in erbium (Er) doped phosphate glass is presented. Such systems can be suitable as integrated devices coupling electronic and photonic data transmissions as well as SPP amplifiers and SPP lasers.